Dopant depletion in the near surface region of thermally prepared silicon (100) in UHV

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1116/1.3694010
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Affiliation
  1. National Research Council of Canada. National Institute for Nanotechnology
FormatText, Article
SubjectCharging characteristics; Dopant atoms; Dopant concentrations; Dopant state; Doped sample; Hydrogen-terminated silicon; Hydrogen-terminated surfaces; Imaging characteristics; Near surface regions; Near-surface; Silicon (100); Ultrahigh vacuum scanning tunneling microscopies; Arsenic; Carrier concentration; Dangling bonds; Electric charge; Hydrogen; Scanning tunneling microscopy; Semiconductor doping
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LanguageEnglish
Peer reviewedYes
NPARC number21269460
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Record identifier16a1a2cb-22ae-494c-ae5b-c21128912fa5
Record created2013-12-12
Record modified2020-04-21
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