| Download | - View accepted manuscript: Surface-directed spinodal decomposition in the pseudobinary alloy (HfO2)x(SiO2)1−x (PDF, 1.9 MiB)
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| DOI | Resolve DOI: https://doi.org/10.1063/1.3448232 |
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| Author | Search for: Liu, J.; Search for: Wu, X.1; Search for: Lennard, W. N.; Search for: Landheer, D.1; Search for: Dharma-Wardana, M. W. C.1 |
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| Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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| Format | Text, Article |
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| Abstract | Hf silicate films (HfO2)0.25(SiO2)0.75 with thicknesses in the range 4–20 nm were grown on silicon substrate by atomic layer deposition at 350 °C. Hf distributions in as-grown and 800 °C annealed films were investigated by high resolution transmission electron microscopy (HRTEM), angle-resolved x-ray photoelectron spectroscopy (ARXPS), and medium energy ion scattering (MEIS). HRTEM images show a layered structure in films thinner than 8 nm. The ARXPS data also reveal a nonuniform distribution of Hf throughout the film depth. Diffusion of SiO2 to the film surface after a longer time anneal was observed by MEIS. All these observations provide evidence for surface-directed spinodal decomposition in the pseudobinary (HfO2)x(SiO2)1−x alloy system. |
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| Publication date | 2010-06-18 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 17326679 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 16c3ff85-c7fa-4ceb-b36a-a96063bb849f |
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| Record created | 2011-03-26 |
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| Record modified | 2020-04-17 |
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