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Reversible passivation of silicon dangling bonds with the stable radical TEMPO

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1021/nl034258
AuthorSearch for: 1; Search for: 2; Search for: 3; Search for: 1
Affiliation
  1. National Research Council of Canada. National Institute for Nanotechnology
  2. National Research Council of Canada. NRC Institute for National Measurement Standards
  3. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
Abstract
TEMPO, 2,2,6,6-tetramethylpiperidinyloxy, was used to passivate dangling bonds on hydrogen-terminated Si(100) and Si(111) surfaces. TEMPO reacts with the dangling bond through a radical coupling reaction of the oxygen and silicon atoms. STM images reveal that the TEMPO-passivated Si is stable under typical imaging conditions and also protects the surface from reaction with styrene. TEMPO may also be desorbed from the surface by scanning at elevated voltages (greater than -3.5 V) and provides the ability to selectively remove TEMPO to prepare single dangling bonds on an otherwise passivated surface.
Publication date
In
  • Nano letters 3, no. 10 (8 October 2003): 1431–1435.
NPARC number12333584
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Record identifier1cf279dc-1d46-4c0e-8cfd-1e7f96aa6bf5
Record created2009-09-10
Record modified2020-04-02
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