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Novel SiO2/AlN/HfAlO/IrO2 Memory with Fast Erase, Large ÄVth, Fast Erase and Good Retention

From National Research Council Canada

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Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
ConferenceSymposium on VLSI Technology, 2005
NPARC number12346663
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Record identifier329ce583-33f4-42f9-8a7d-d1413d861a08
Record created2009-09-17
Record modified2020-04-16
Date modified: