Selected porosification of n-InP(100) after focused ion beam implantation of Si
Selected porosification of n-InP(100) after focused ion beam implantation of Si
| DOI | Resolve DOI: https://doi.org/10.1002/pssa.200306496 |
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| Author | Search for: ; Search for: ; Search for: 1; Search for: 1; Search for: 1; Search for: 1; Search for: |
| Affiliation |
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| Format | Text, Article |
| Publication date | 2003 |
| Publisher | Wiley |
| In | |
| Language | English |
| Peer reviewed | Yes |
| NPARC number | 12744689 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | 49b91a83-04a9-49ed-b278-b524f16c9cd9 |
| Record created | 2009-10-27 |
| Record modified | 2020-04-02 |
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