Using self-assembled block copolymer templates to mediate nanoscale patterning on technologically relevant semiconductor surfaces
Using self-assembled block copolymer templates to mediate nanoscale patterning on technologically relevant semiconductor surfaces
| Format | Text, Other |
|---|---|
| Publication date | 2006 |
| In | |
| NRC number | NRC-NINT-188 |
| NPARC number | 8926546 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | 5d0d1298-b6ac-49ef-8672-81e511f405cf |
| Record created | 2009-04-23 |
| Record modified | 2020-09-25 |
- Date modified: