Room temperature deposition of ITO using r.f. magnetron sputtering
Room temperature deposition of ITO using r.f. magnetron sputtering
DOI | Resolve DOI: https://doi.org/10.1016/S0040-6090(02)00425-X |
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Format | Text, Article |
Publication date | 2002 |
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NPARC number | 12744715 |
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Record identifier | 6f37ef24-058a-4252-a589-d1f81cdd172d |
Record created | 2009-10-27 |
Record modified | 2020-03-30 |
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