Growth and characterization of metastable hexagonal nickel thin films via plasma-enhanced atomic layer deposition
Growth and characterization of metastable hexagonal nickel thin films via plasma-enhanced atomic layer deposition
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DOI | Resolve DOI: https://doi.org/10.1021/acsami.7b05571 |
Author | Search for: Motamedi, Pouyan1; Search for: Bosnick, Ken1; Search for: Cui, Kai1; Search for: Cadien, Ken1; Search for: Hogan, James David |
Name affiliation |
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Format | Text, Article |
Journal title | ACS Applied Materials & Interfaces |
ISSN | 1944-8244 1944-8252 |
Volume | 9 |
Issue | 29 |
Pages | 24722–24730 |
Subject | AFM; atomic layer deposition; HCP; hexagonal; nickel; TEM; XRD |
Abstract | |
Publication date | 2017-07-03 |
Publisher | American Chemical Society |
Language | English |
Peer reviewed | Yes |
NPARC number | 23003091 |
Export citation | Export as RIS |
Report a correction | Report a correction | Record identifier | 82479cdb-9a3f-44b4-88f0-24c6dd0f3e62 |
Record created | 2018-04-19 |
Record modified | 2020-05-30 |