Growth and characterization of metastable hexagonal nickel thin films via plasma-enhanced atomic layer deposition

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DOIResolve DOI: https://doi.org/10.1021/acsami.7b05571
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Name affiliation
  1. National Research Council of Canada. Nanotechnology
FormatText, Article
Journal titleACS Applied Materials & Interfaces
ISSN1944-8244
1944-8252
Volume9
Issue29
Pages2472224730
SubjectAFM; atomic layer deposition; HCP; hexagonal; nickel; TEM; XRD
Abstract
Publication date
PublisherAmerican Chemical Society
LanguageEnglish
Peer reviewedYes
NPARC number23003091
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Record identifier82479cdb-9a3f-44b4-88f0-24c6dd0f3e62
Record created2018-04-19
Record modified2020-05-30
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