Pressure-induced changes on the electronic structure and electron topology in the direct FCC → SH transformation of silicon

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1021/jp408666q
AuthorSearch for: ; Search for: ; Search for: 1; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for:
Affiliation
  1. National Research Council of Canada
FormatText, Article
Abstract
Publication date
In
LanguageEnglish
Peer reviewedYes
NPARC number21270756
Export citationExport as RIS
Report a correctionReport a correction (opens in a new tab)
Record identifier914fa536-b2bd-4b78-bd86-f82b48d787d2
Record created2014-02-17
Record modified2020-04-22
Date modified: