| Download | - View accepted manuscript: All-optical elastic characterization of silicon wafers and cantilevers beams by vibration modes (PDF, 882 KiB)
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| DOI | Resolve DOI: https://doi.org/10.1063/1.2184711 |
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| Author | Search for: França, D. R.1; Search for: Blouin, A.1 |
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| Affiliation | - National Research Council of Canada. NRC Industrial Materials Institute
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| Format | Text, Article |
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| Conference | The 32th Annual Review of Progress in Quantitative Nondestructive Evaluation, July 31 - August 05 2005, Brunswick, Maine, USA |
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| Abstract | An all-optical technique is developed to determine elastic parameters of both semiconductor wafers and cantilever beams through optical excitation and detection of vibration modes. Resonance frequency measurements of these modes are used to determine the materials Young’s modulus and Poisson’s ratio. The technique is remote, non-destructive and works on-line, making it an attractive inspection tool for use in semiconductor foundries and MEMS industries. Experimental results are compared with the values calculated by the theory of elasticity. |
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| Publication date | 2006-03-06 |
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| Language | English |
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| Peer reviewed | Yes |
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| NRC number | NRCC 48844 |
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| NPARC number | 15877974 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 98ffbbca-a973-43df-8c76-de18b43b83a8 |
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| Record created | 2010-07-30 |
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| Record modified | 2020-04-22 |
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