A well defined electron beam source produced by the controlled field assisted etching of metal tips to < 1 nm radius
A well defined electron beam source produced by the controlled field assisted etching of metal tips to < 1 nm radius
| Format | Text, Article |
|---|---|
| Publication date | 2007 |
| In | |
| Peer reviewed | Yes |
| NRC number | 525 |
| NPARC number | 8926365 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | 9cec4ae2-a405-47bb-8d09-521b2cfdbb2a |
| Record created | 2009-04-23 |
| Record modified | 2020-05-10 |
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