Poly(ether sulfone) as a Negative Resist for Electron-Beam Lithography
Poly(ether sulfone) as a Negative Resist for Electron-Beam Lithography
| Format | Text, Article |
|---|---|
| Publication date | 2007 |
| In | |
| Language | English |
| Peer reviewed | Yes |
| NRC number | NRC-NINT-235 |
| NPARC number | 8926402 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | a1b30037-d051-4505-a133-2769f4201893 |
| Record created | 2009-04-23 |
| Record modified | 2023-05-10 |
- Date modified: