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Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium

From National Research Council Canada

EditorSearch for: Sah, R. E.; Search for: Sundaram, K. B.; Search for: Deen, M. J.; Search for: Landheer, D.1; Search for: Brown, W. D.; Search for: Misra, D.
Affiliation
  1. National Research Council Canada. NRC Institute for Microstructural Sciences
FormatText, Proceedings
Conference7th Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, 2003, Paris, France
ISBN1566773474
Physical description684 p.
Abstract
The papers address a very wide range of fabrication and characterization techniques and applications of thin films for microelectronic devices. More specific topics address by the papers include: reliability, interface states, gate oxide studies, passivation, tunneling phenomena, and dielectric breakdown.
Publication date
PublisherElectrochemical Society
Series
  • Proceedings (Electrochemical Society) 2003-2.
LanguageEnglish
NPARC number12346596
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Record identifierb96cb513-68f1-4e8c-9633-ef87f63985ca
Record created2009-09-17
Record modified2020-03-02
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