Evaluation of the electrical properties of nickel silicide films for ULSI applications
Evaluation of the electrical properties of nickel silicide films for ULSI applications
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| Format | Text, Article |
| Conference | Thirteenth International VLSI Multilevel Interconnection Conference, 22-23 February 1996, Santa Clara, CA, USA |
| Publication date | 1996-06 |
| In | |
| NPARC number | 12327202 |
| Export citation | Export as RIS |
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| Record identifier | d536e210-7ee2-4a6b-9383-eda126f10932 |
| Record created | 2009-09-10 |
| Record modified | 2020-03-20 |
- Date modified: