Synthesis and characterization of calixarene derivatives as resist materials fo electron-beam lithography
Synthesis and characterization of calixarene derivatives as resist materials fo electron-beam lithography
| Format | Text, Article |
|---|---|
| Publication date | 2006 |
| In | |
| Peer reviewed | Yes |
| NRC number | 174 |
| NPARC number | 8926407 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | dfdaeb24-e614-418b-a22d-25b7ede46230 |
| Record created | 2009-04-23 |
| Record modified | 2020-04-22 |
- Date modified: