| Download | - View accepted manuscript: Trimming phase and birefringence errors in planar lightwave circuits with deep ultraviolet femtosecond laser (PDF, 1014 KiB)
|
|---|
| DOI | Resolve DOI: https://doi.org/10.1049/el:20045975 |
|---|
| Author | Search for: Chen, Qiying1; Search for: Chen, Kevin P.; Search for: Buric, Michael; Search for: Nikumb, Suwas1 |
|---|
| Affiliation | - National Research Council of Canada. NRC Industrial Materials Institute
|
|---|
| Format | Text, Article |
|---|
| Subject | KrF excimer laser; SiO2; birefringence errors; deep ultraviolet femtosecond laser; hydrogen free Mach-Zehnder planar waveguide circuit; planar lightwave circuits; refractive index; silica waveguies; trimming phase errors; ultraviolet photosensitivity |
|---|
| Abstract | A deep ultraviolet femtosecond laser was employed to trim phase and birefringence errors in silica planar lightwave circuits. A permanent refractive index change of ∼3.8×10-4 and a birefringence change of 1.0×10-4 were induced in hydrogen-free Mach-Zehnder planar waveguide circuits. The ultrafast laser enhances the ultraviolet photosensitivity response in silica waveguides by two orders of magnitude greater than that of a nanosecond 248 nm KrF excimer laser. |
|---|
| Publication date | 2004-09-16 |
|---|
| In | |
|---|
| Language | English |
|---|
| Peer reviewed | Yes |
|---|
| NPARC number | 21272506 |
|---|
| Export citation | Export as RIS |
|---|
| Report a correction | Report a correction (opens in a new tab) |
|---|
| Record identifier | ea453f9f-d732-4029-afc6-ba1f369f1e0c |
|---|
| Record created | 2014-12-01 |
|---|
| Record modified | 2020-06-04 |
|---|
