L-shaped fiber-chip grating couplers with high directionality and low reflectivity fabricated with deep-UV lithography

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1364/OL.42.003439
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Name affiliation
  1. National Research Council Canada. Advanced Electronics and Photonics
FormatText
TypeArticle
Journal titleOptics Letters
ISSN0146-9592
1539-4794
Volume42
Issue17
Pages3439–3442
Abstract
Grating couplers enable position-friendly interfacing of silicon chips by optical fibers. The conventional coupler designs call upon comparatively complex architectures to afford efficient light coupling to sub-micron silicon-on-insulator (SOI) waveguides. Conversely, the blazing effect in double-etched gratings provides high coupling efficiency with reduced fabrication intricacy. In this Letter, we demonstrate for the first time, to the best of our knowledge, the realization of an ultra-directional L-shaped grating coupler, seamlessly fabricated by using 193 nm deep-ultraviolet (deep-UV) lithography. We also include a subwavelength index engineered waveguide-to-grating transition that provides an eight-fold reduction of the grating reflectivity, down to 1% (−20  dB). A measured coupling efficiency of −2.7  dB (54%) is achieved, with a bandwidth of 62 nm. These results open promising prospects for the implementation of efficient, robust, and cost-effective coupling interfaces for sub-micrometric SOI waveguides, as desired for large-volume applications in silicon photonics.
Publication date
PublisherOptical Society of America
LanguageEnglish
Peer reviewedYes
NPARC number23002295
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