Drastic Ion-implantation-induced intermixing during annealing of self-assembled InAs/InP (100) Quantum Dots
Drastic Ion-implantation-induced intermixing during annealing of self-assembled InAs/InP (100) Quantum Dots
| DOI | Resolve DOI: https://doi.org/10.1088/0957-4484/18/1/015404 |
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| Author | Search for: ; Search for: 1; Search for: ; Search for: 2; Search for: ; Search for: |
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| Format | Text, Article |
| Publication date | 2006 |
| In | |
| NPARC number | 12744833 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | f4ebb1e3-365e-4164-9bee-cfc182ffd6a4 |
| Record created | 2009-10-27 |
| Record modified | 2020-04-22 |
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