| DOI | Trouver le DOI : https://doi.org/10.1116/1.4729592 |
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| Auteur | Rechercher : Van Dijken, Jaron G.; Rechercher : Brett, Michael J.1 |
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| Affiliation | - Conseil national de recherches du Canada. Technologies de sécurité et de rupture
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| Format | Texte, Article |
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| Sujet | Ar plasmas; Argon plasma etching; Columnar morphology; Electrical conductivity; Forming gas; Indium tin oxide; ITO electrodes; ITO films; Nanopillars; Organic solar cell; Vertically aligned; Electric conductivity; Opacity; Tin oxides; Nanostructures |
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| Résumé | The authors demonstrate the formation of vertically aligned indium tin oxide (ITO) nanopillars by exposing planar ITO films to Ar plasma, the conditions of which determine the size, spacing, and aspect ratio of the pillars. Annealing in air and forming gas is used to recover and optimize the optical transmittance and electrical conductivity of the nanopillar films. The final product is an ITO film whose superior optical transmittance and strong electrical conductivity combine with its robust columnar morphology and processing scalability to make it suitable for use in highly absorbing organic solar cells. |
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| Date de publication | 2012-06-15 |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 21270231 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 044355a0-50c8-4472-bf80-c41c68a75713 |
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| Enregistrement créé | 2014-01-14 |
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| Enregistrement modifié | 2020-04-21 |
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