| DOI | Trouver le DOI : https://doi.org/10.1017/S1431927611008208 |
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| Auteur | Rechercher : Zhang, Huairuo1; Rechercher : Egerton, Ray F.1; Rechercher : Malac, Marek1 |
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| Affiliation | - Conseil national de recherches Canada
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| Format | Texte, Article |
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| Conférence | Microscopy & Microanalysis 2011, August 7-11, 2011, Nashville, Tennessee, United States |
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| Résumé | Electron energy-loss spectroscopy (EELS) is routinely used to estimate local specimen thickness in a TEM. The relative specimen thickness is conveniently estimated from the low-loss spectrum using log-ratio method with a formula t/λ = ln(Iₜ /I₀). Here λ is an inelastic mean free path (IMFP) for the material in question, I₀ is the area under zero-loss peak (ZLP) and Iₜ the total area under the whole spectrum. An absolute thickness t measurement requires knowledge of the IMFP, which depends on the specimen material, electron energy and collection semiangle. The most commonly used IMFP formula, incorporated into Gatan Digital Micrograph software, was developed by Malis et al. and exhibits a smooth dependence on atomic number Z. |
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| Date de publication | 2011-08-11 |
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| Maison d’édition | Cambridge University Press |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 0655c119-b769-4dde-bdd1-8f7efd5ef076 |
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| Enregistrement créé | 2020-03-11 |
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| Enregistrement modifié | 2024-05-15 |
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