| DOI | Trouver le DOI : https://doi.org/10.1364/OL.39.005661 |
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| Auteur | Rechercher : Soler Penadés, J.; Rechercher : Alonso-Ramos, C.; Rechercher : Khokhar, A. Z.; Rechercher : Nedeljkovic, M.; Rechercher : Boodhoo, L. A.; Rechercher : Ortega-Moñux, A.; Rechercher : Molina-Fernández, I.; Rechercher : Cheben, P.1Identifiant ORCID : https://orcid.org/0000-0003-4232-9130; Rechercher : Mashanovich, G. Z. |
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| Affiliation | - Conseil national de recherches du Canada. Institut des sciences des microstructures du CNRC
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| Format | Texte, Article |
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| Sujet | midinfrared; SOI waveguides; sub-wave length grating |
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| Résumé | We present a new type of mid-infrared silicon-on-insulator (SOI) waveguide. The waveguide comprises a subwavelength lattice of holes acting as lateral cladding while at the same time allowing for the bottom oxide (BOX) removal by etching. The waveguide loss is determined at the wavelength of 3.8 μm for structures before and after being underetched using both vapor phase and liquid hydrofluoric acid (HF). A propagation loss of 3.4 dB/cm was measured for a design with a 300 nm grating period and 150 nm holes after partial removal (560 nm) of BOX by vapor phase HF etching. We also demonstrate an alternative design with 550 nm period and 450 nm holes, which allows a faster and complete removal of the BOX by liquid phase HF etching, yielding the waveguide propagation loss of 3.6 dB/cm. |
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| Date de publication | 2014-09-25 |
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| Maison d’édition | The Optical Society |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 21272690 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 251328b4-88cd-478b-b5e5-f5db48c857d0 |
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| Enregistrement créé | 2014-12-03 |
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| Enregistrement modifié | 2020-04-22 |
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