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DOI | Trouver le DOI : https://doi.org/10.1016/j.jhin.2021.02.018 |
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Auteur | Rechercher : Kumkrong, P.1; Rechercher : Scoles, L.1; Rechercher : Brunet, Y.2; Rechercher : Baker, S.2; Rechercher : Mercier, P. H. J.1; Rechercher : Poirier, D.3 |
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Affiliation | - Conseil national de recherches du Canada. Énergie, les mines et l'environnement
- Conseil national de recherches du Canada. Génie océanique, côtier et fluvial
- Conseil national de recherches du Canada. Automobile et les transports de surface
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Format | Texte, Article |
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Sujet | facepiece respirator; KN95; FFP2; inhalation risk; sanitization; skin exposure |
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Résumé | Background: Hydrogen peroxide and ozone have been used as chemical decontamination agents for N95 masks during supply shortages. If left behind on the masks, the residues of both chemicals represent a potential health hazard by skin contact and respiratory exposure.
Aim: Characterization of hydrogen peroxide and ozone residues on mask surfaces after chemical decontamination.
Methods: Various N95 masks were decontaminated using two commercial systems employing either aerosol spray or vaporization of hydrogen peroxide in the presence of ozone. Following the decontamination, the masks were aired out to eliminate moisture and potential chemical residues. The residual hydrogen peroxide and ozone were monitored in the gas phase above the mask surface, and hydrogen peroxide residue directly on mask surfaces using a colorimetric assay.
Findings: After decontamination, hydrogen peroxide and ozone were detectable in the gas phase in the vicinity of masks even after 5 h of aeration. Hydrogen peroxide was also detected on all studied masks, and levels up to 56 mg per mask were observed after 0.5 h of aeration. All residues gradually decreased with aeration, likely due to decomposition and vaporization.
Conclusion: Hydrogen peroxide and ozone were present on N95 masks after decontamination. With appropriate aeration, the gaseous residue levels in the vicinity of the masks decreased to permissible levels as defined by the US Occupational Safety and Health Administration. Reliable assays to monitor these residues are necessary to ensure the safety of the mask users. |
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Date de publication | 2021-02-25 |
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Maison d’édition | Elsevier |
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Licence | |
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Dans | |
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Langue | anglais |
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Publications évaluées par des pairs | Oui |
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Numéro du CNRC | NRC-EME-56199 |
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Exporter la notice | Exporter en format RIS |
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Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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Identificateur de l’enregistrement | 31f926ef-5416-4c24-8fdd-b810dee23ed8 |
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Enregistrement créé | 2021-04-29 |
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Enregistrement modifié | 2021-04-29 |
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