| DOI | Trouver le DOI : https://doi.org/10.1149/1.2048437 |
|---|
| Auteur | Rechercher : Bardwell, J. A.1; Rechercher : Schmuki, P.; Rechercher : Sproule, G. I.1; Rechercher : Landheer, D.1; Rechercher : Mitchell, D. F.1 |
|---|
| Affiliation | - Conseil national de recherches du Canada. Institut des sciences des microstructures du CNRC
|
|---|
| Format | Texte, Article |
|---|
| Sujet | anodised layers; bonds (chemical); dielectric thin films; electric properties; MOS capacitors; oxidation; electric properties; ultraviolet radiation effects |
|---|
| Résumé | Gate oxides 4 to 50 nm thick have been grown on Si(100) by anodic oxidation at room temperature. Different concentrationsof aqueous NH4OH were used as the electrolyte. Growth of oxides on n-type substrates required light illumination;however, the uniformity of the oxide thickness was not critically dependent on the uniformity of the illumination as longas light saturation conditions were maintained. The oxides on n-type Si were slightly thicker than those on p-type Si underthe same growth conditions; nevertheless the physical properties of the oxides grown on the two types of substrates weresimilar. The growth mechanism was determined by secondary ion mass spectrometry with 18O labeling, and depends on thesolution pH. The as-grown and annealed oxides were characterized by Fourier transform infrared and by HF etch rateexperiments. After appropriate annealing, simple metal-oxide-semiconductor capacitors exhibited promising electricalproperties. |
|---|
| Date de publication | 1995-11-01 |
|---|
| Dans | |
|---|
| Langue | anglais |
|---|
| Publications évaluées par des pairs | Oui |
|---|
| Numéro NPARC | 12338720 |
|---|
| Exporter la notice | Exporter en format RIS |
|---|
| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
|---|
| Identificateur de l’enregistrement | 33a21ca0-1be5-44a7-b54b-2b5171738db7 |
|---|
| Enregistrement créé | 2009-09-10 |
|---|
| Enregistrement modifié | 2020-04-29 |
|---|
