| DOI | Trouver le DOI : https://doi.org/10.1117/12.922659 |
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| Auteur | Rechercher : Van Dijken, Jaron G.; Rechercher : Wu, Nathanael L.-W.; Rechercher : Fleischauer, Michael D.1; Rechercher : Buriak, Jillian M.1; Rechercher : Brett, Michael J.1 |
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| Affiliation | - Conseil national de recherches du Canada. Technologies de sécurité et de rupture
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| Format | Texte, Article |
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| Conférence | Organic Photonics V, April 16-18, 2012, Brussels |
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| Sujet | Additional control; Column dimensions; Columnar arrays; Columnar morphology; Device fabrications; Donor layers; Film evolution; Glancing Angle Deposition; Glancing angle deposition technique; Metalphthalocyanines; Morphology control; Motion techniques; Nano-structuring; Nanoscale patterning; Organic photovoltaic devices; Organic photovoltaics; Organic thin films; Patterned ITO; Seed spacing; Small molecules; Surface patterning; Vertical posts; Zinc phthalocyanines; Block copolymers; Lithography; Morphology; Photovoltaic effects; Platinum; Silicon oxides; Surfaces; Thin films; Zinc compounds; Vapor deposition |
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| Résumé | We present methods for nanostructuring organic thin films for organic photovoltaic (OPV) devices. Using the glancing angle deposition (GLAD) technique, we fabricate a variety of columnar morphologies of metal phthalocyanine (MPc) materials that can be used as structured donor layers in OPV devices. We leverage this capability with block copolymer surface patterning techniques to achieve perfectly periodic columnar arrays while providing additional control over column dimensions, spacing, and density. Our investigation employs hexagonal seed patterns of platinum on silicon and we vary the seed spacing between 40 nm and 60 nm. We find that pattern resemblance begins to fade when the film thickness exceeds the seed spacing. We compare the film evolution between vertical post and slanted post morphologies, and use advanced substrate motion techniques to constrain column diameters. We conclude by addressing the compatibility of surface patterning with device fabrication. Patterned ITO surfaces and SiO 2 seed patterns are shown. |
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| Date de publication | 2012-06-01 |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 21270867 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 53922a22-5080-41ed-b8d3-528cbf82d1c8 |
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| Enregistrement créé | 2014-02-17 |
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| Enregistrement modifié | 2020-04-21 |
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