| Téléchargement | - Voir le manuscrit accepté : Polymer peel-off mask for high-resolution surface derivatization, neuron placement and guidance (PDF, 9.8 Mio)
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| DOI | Trouver le DOI : https://doi.org/10.1002/bit.24887 |
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| Auteur | Rechercher : Martinez, Dolores1; Rechercher : Py, Christopher1; Rechercher : Denhoff, Mike1; Rechercher : Monette, Robert1; Rechercher : Comas, Tanya1; Rechercher : Krantis, Anthony1; Rechercher : Mealing, Geoffrey1 |
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| Affiliation | - Conseil national de recherches du Canada. Technologies de l'information et des communications
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| Format | Texte, Article |
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| Sujet | chemical patterning; process guidance; dry lift-off; neural network |
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| Résumé | We present a dry lift-off method using a chemically resistant spin-on plastic, polyimide, to pattern surfaces with high accuracy and resolution. Using well-known lithographic and reactive ion etching techniques, the spin-on polymer is patterned over a silicon dioxide surface. The plastic efficiently adheres to the silicon dioxide surface during the chemical modification and is readily lifted-off following the derivatization process, permitting highly reliable surface derivatization. The verticality of the reactive ion etch enables sub-micrometer features to be patterned, down to 0.8μm. The technique is used to pattern neurons on silicon dioxide surfaces: efficient neuron placement over a 4mm area is shown for patterns larger than 50μm while process guidance is shown for 10μm patterns. |
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| Date de publication | 2013-05-29 |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 21270703 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 5f776607-e59c-47e8-9e25-d6d65854d521 |
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| Enregistrement créé | 2014-02-17 |
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| Enregistrement modifié | 2020-06-04 |
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