| Téléchargement | - Voir la version finale : Charging of electron beam irradiated amorphous carbon thin films at liquid nitrogen temperature (PDF, 780 Kio)
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| DOI | Trouver le DOI : https://doi.org/10.1016/j.ultramic.2018.10.010 |
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| Auteur | Rechercher : Hettler, Simon; Rechercher : Onoda, Jo; Rechercher : Wolkow, Robert; Rechercher : Pitters, Jason1; Rechercher : Malac, Marek1 |
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| Affiliation | - Conseil national de recherches du Canada. Nanotechnologie
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| Format | Texte, Article |
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| Sujet | electron-beam induced charging; thin film; phase plate; radiation damage; hole free phase plate; volta phase plate; transmission electron microscope |
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| Résumé | We studied the charging behavior of an amorphous carbon thin film kept at liquid-nitrogen temperature under focused electron-beam irradiation. Negative charging of the thin film is observed. The charging is attributed to a local change in the work function of the thin film induced by electron-stimulated desorption similar to the working principle of the hole free phase plate in its Volta potential implementation at elevated temperature. The negative bias of the irradiated film arises from the electron beam induced desorption of water molecules from the carbon film surface. The lack of positive charging, which is expected for non-conductive materials, is explained by a sufficient electrical conductivity of the carbon thin film even at liquid-nitrogen temperature as proven by multi-probe scanning tunneling microscopy and spectroscopy measurements. |
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| Date de publication | 2018-10-29 |
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| Maison d’édition | Elsevier |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 688c17f8-4f7f-477c-bfcf-8f6910701fa7 |
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| Enregistrement créé | 2020-01-08 |
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| Enregistrement modifié | 2020-05-30 |
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