| Téléchargement | - Voir la version finale : Columnar thin films for three-dimensional microbatteries (PDF, 817 Kio)
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| DOI | Trouver le DOI : https://doi.org/10.1149/1.3006001 |
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| Auteur | Rechercher : Fleischauer, M. D.1; Rechercher : Li, Jing; Rechercher : Brett, M. J.1 |
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| Affiliation | - Conseil national de recherches du Canada. Nanotechnologie
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| Format | Texte, Article |
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| Sujet | electrochemical electrodes; elemental semiconductors; porous semiconductors; secondary cells; semiconductor thin films; silicon; vapour deposition |
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| Résumé | Controlled-porosity Si thin films suitable for use as high-aspect-ratio microbattery electrodes were produced using the glancing angle deposition (GLAD) technique. GLAD is a high-vacuum physical vapor deposition method that can be used to produce a variety of film morphologies from most vacuum-compatible materials. No lithographic steps were required to create the porous, columnar thin films. Initial electrochemical results indicate large gravimetric and areal capacities (3600mAh∕g, 90μAh/cm2, respectively), and good capacity retention (3000mAh∕g after 70 charge/discharge cycles) can be obtained from Si vertical post morphology films. Areal capacity and capacity retention can likely be further improved by optimizing the film morphology, electrode material composition, and cycling conditions. |
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| Date de publication | 2008-11-05 |
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| Maison d’édition | The Electrochemical Society |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 23004591 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 6a47f3ce-fd31-4a2f-b60a-b09323a35726 |
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| Enregistrement créé | 2018-11-26 |
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| Enregistrement modifié | 2020-05-30 |
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