| DOI | Resolve DOI: https://doi.org/10.3390/molecules170910119 |
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| Author | Search for: Van Dijken, Jaron G.; Search for: Brett, Michael J.1 |
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| Affiliation | - National Research Council of Canada. Security and Disruptive Technologies
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| Format | Text, Article |
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| Subject | carbon; copper; indole derivative; nitrogen; organometallic compound; oxygen; phthalocyanine copper; chemistry; gas laser; surface property; X ray photoelectron spectroscopy; Carbon; Copper; Indoles; Lasers, Gas; Nitrogen; Organometallic Compounds; Oxygen; Photoelectron Spectroscopy; Surface Properties |
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| Abstract | We investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less than 20 nm in diameter. The changes in morphology are independent of plasma power, which controls the etch rate only. Analysis by X-ray photoelectron spectroscopy shows that surface concentrations of copper and oxygen increase with etch time, while carbon and nitrogen are depleted. Despite these changes in surface stoichiometry, we observe no effect on the work function. The absorbance and X-ray diffraction spectra show no changes other than the peaks diminishing with etch time. These findings have important implications for organic photovoltaic devices which seek nanopillar thin films of metal phthalocyanine materials as an optimal structure. |
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| Publication date | 2012-08-24 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 21270236 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 17073649-7a2b-4263-a47f-5fd633a21084 |
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| Record created | 2014-01-15 |
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| Record modified | 2020-04-21 |
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