| DOI | Trouver le DOI : https://doi.org/10.3390/molecules170910119 |
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| Auteur | Rechercher : Van Dijken, Jaron G.; Rechercher : Brett, Michael J.1 |
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| Affiliation | - Conseil national de recherches du Canada. Technologies de sécurité et de rupture
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| Format | Texte, Article |
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| Sujet | carbon; copper; indole derivative; nitrogen; organometallic compound; oxygen; phthalocyanine copper; chemistry; gas laser; surface property; X ray photoelectron spectroscopy; Carbon; Copper; Indoles; Lasers, Gas; Nitrogen; Organometallic Compounds; Oxygen; Photoelectron Spectroscopy; Surface Properties |
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| Résumé | We investigate the evolution of copper phthalocyanine thin films as they are etched with argon plasma. Significant morphological changes occur as a result of the ion bombardment; a planar surface quickly becomes an array of nanopillars which are less than 20 nm in diameter. The changes in morphology are independent of plasma power, which controls the etch rate only. Analysis by X-ray photoelectron spectroscopy shows that surface concentrations of copper and oxygen increase with etch time, while carbon and nitrogen are depleted. Despite these changes in surface stoichiometry, we observe no effect on the work function. The absorbance and X-ray diffraction spectra show no changes other than the peaks diminishing with etch time. These findings have important implications for organic photovoltaic devices which seek nanopillar thin films of metal phthalocyanine materials as an optimal structure. |
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| Date de publication | 2012-08-24 |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 21270236 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 17073649-7a2b-4263-a47f-5fd633a21084 |
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| Enregistrement créé | 2014-01-15 |
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| Enregistrement modifié | 2020-04-21 |
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