DOI | Resolve DOI: https://doi.org/10.1049/el:20030548 |
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Author | Search for: Wei, S. C.; Search for: Su, Y. K.; Search for: Kuan, T. M.; Search for: Wang, R. L.; Search for: Chang, Shoude1; Search for: Ko, C. H.; Search for: Webb, James2; Search for: Bardwell, Jennifer1 |
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Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
- National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
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Format | Text, Article |
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Abstract | The low-frequency noise of AlGaN/GaN heterojunction field-effect transistors (HFETs) with different Al fraction of the AlGaN layer was measured and characterised. The DC characteristics of AlGaN/GaN HFETs with higher Al fraction is better. However, the noise performance is poorer owing to the large lattice mismatch with higher Al fraction in the AlGaN layer. The pure flicker noise and lower noise power density can be obtained by the smaller Al fraction in the AlGaN layer of AlGaN/GaN HFETs. |
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Publication date | 2003 |
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In | |
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Peer reviewed | Yes |
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NPARC number | 12744266 |
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Export citation | Export as RIS |
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Report a correction | Report a correction (opens in a new tab) |
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Record identifier | 23c94287-d437-4063-99c8-1cc4d9532b21 |
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Record created | 2009-10-27 |
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Record modified | 2021-05-10 |
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