| DOI | Resolve DOI: https://doi.org/10.1017/S1431927611006003 |
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| Author | Search for: Hoyle, David; Search for: Malac, Marek1; Search for: Trudeau, Michel; Search for: Woo, Patrick |
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| Affiliation | - National Research Council of Canada
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| Format | Text, Article |
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| Conference | Microscopy & Microanalysis 2011, August 7-11, 2011, Nashville, Tennessee, United States |
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| Abstract | Surface contamination due to hydrocarbons is frequently a limiting factor in TEM, scanning TEM (STEM) or SEM observations. Regardless whether the contamination arises from the specimen preparation such as rinse agents or FIB processing or just due to exposure to hydrocarbons in the atmosphere it is a long standing problem for anyone doing high-resolution imaging or analysis. The use of ultraviolet light (UV) as a treatment for removal has long been established. In this paper we will expand on the use of a UV-light treatment using the commercially available Hitachi ZONE cleaner used for reducing contamination on sensitive samples for TEM, STEM and FIB and SEM analysis. |
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| Publication date | 2011-08-11 |
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| Publisher | Cambridge University Press |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 2be20635-d420-4351-9cc3-66b025d31f66 |
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| Record created | 2020-03-11 |
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| Record modified | 2024-05-15 |
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