| DOI | Trouver le DOI : https://doi.org/10.1017/S1431927611006003 |
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| Auteur | Rechercher : Hoyle, David; Rechercher : Malac, Marek1; Rechercher : Trudeau, Michel; Rechercher : Woo, Patrick |
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| Affiliation | - Conseil national de recherches du Canada
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| Format | Texte, Article |
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| Conférence | Microscopy & Microanalysis 2011, August 7-11, 2011, Nashville, Tennessee, United States |
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| Résumé | Surface contamination due to hydrocarbons is frequently a limiting factor in TEM, scanning TEM (STEM) or SEM observations. Regardless whether the contamination arises from the specimen preparation such as rinse agents or FIB processing or just due to exposure to hydrocarbons in the atmosphere it is a long standing problem for anyone doing high-resolution imaging or analysis. The use of ultraviolet light (UV) as a treatment for removal has long been established. In this paper we will expand on the use of a UV-light treatment using the commercially available Hitachi ZONE cleaner used for reducing contamination on sensitive samples for TEM, STEM and FIB and SEM analysis. |
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| Date de publication | 2011-08-11 |
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| Maison d’édition | Cambridge University Press |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 2be20635-d420-4351-9cc3-66b025d31f66 |
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| Enregistrement créé | 2020-03-11 |
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| Enregistrement modifié | 2024-05-15 |
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