| DOI | Resolve DOI: https://doi.org/10.1109/ICO-IP.2011.5953786 |
|---|
| Author | Search for: Halir, R.; Search for: Molina-Fernández, Í.; Search for: Cheben, P.1ORCID identifier: https://orcid.org/0000-0003-4232-9130; Search for: Schmid, J.H.1; Search for: Ma, R.1; Search for: Janz, S.1; Search for: Xu, D.-X.1; Search for: Densmore, A.1; Search for: Fédéli, J.-M. |
|---|
| Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
|
|---|
| Format | Text, Article |
|---|
| Conference | 2011 ICO International Conference on Information Photonics, IP 2011, 18 May 2011 through 20 May 2011, Ottawa, ON |
|---|
| Subject | DUV lithography; effective media; effective medium; grating couplers; high-volume production; single etch; sub-wave length grating; sub-wavelength structures; photonics |
|---|
| Abstract | Fibre-to-chip grating couplers are an efficient means for injecting and extracting light from silicon-wire waveguides. Here we present the design of single-etch couplers, based on effective media implemented with sub-wavelength gratings. We show that the pitch of these sub-wavelength structures can be increased to make their fabrication compatible with deep-ultraviolet lithography, without compromising their effective medium behavior. We experimentally demonstrate fully-etched grating couplers fabricated with DUV lithography. © 2011 IEEE. |
|---|
| Publication date | 2011 |
|---|
| In | |
|---|
| Language | English |
|---|
| Peer reviewed | Yes |
|---|
| NPARC number | 21271564 |
|---|
| Export citation | Export as RIS |
|---|
| Report a correction | Report a correction (opens in a new tab) |
|---|
| Record identifier | 2fe57029-43c7-4cc9-9466-7324d8ff0df1 |
|---|
| Record created | 2014-03-24 |
|---|
| Record modified | 2020-04-21 |
|---|
