Fabrication of kinoform structures by electron beam lithography using resist contrast curve polynomial fitting
Fabrication of kinoform structures by electron beam lithography using resist contrast curve polynomial fitting
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Format | Text, Article |
Conference | 11th Canadian Semiconductor Technology Conference, 2003, Ottawa |
NPARC number | 12346636 |
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Record identifier | 365d6ec1-f6e7-4899-b22e-a0a497d42569 |
Record created | 2009-09-17 |
Record modified | 2020-04-16 |
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