Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1117/12.2182633
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Name affiliation
  1. National Research Council Canada. Security and Disruptive Technologies
FormatText
TypeArticle
Proceedings titleDamage to VUV, EUV, and X-ray Optics V
Series titleProceedings of SPIE; no. 9511
ConferenceSPIE Optics + Optoelectronics, April 13-15, 2015, Prague, Czech Republic
ISSN0277-786X
1996-756X
ISBN9781628416329
Article number95110C
Subjectelectromagnetic pulse; fused silica; ionization; laser pulses; multiphoton processes; photoionization; time delay; ultrafast lasers; ultrashort pulses; X-ray optics; avalanche ionization; damage formation; femtosecond laser machining; multi-photon absorption; multiphoton ionization; pulse durations; rate-equation models; UV pulse; pulse generators
Abstract
We investigate damage formation on the surface of fused silica by two femtosecond laser pulses, a tightly focused 266 nm (UV) pulse followed by a loosely focused 800 nm (IR) pulse. We show that the damage size is determined by the UV pulse, and only a small fraction of the normal UV damage threshold energy is needed to cause damage when combined with the properly delayed IR pulse. Our results, analyzed with a rate equation model, suggest that the UV pulse generates seed electrons through multiphoton absorption and the IR pulse utilizes these electrons to cause damage by avalanche ionization. By tuning such parameters like pulse energy, time delay, IR pulse duration and polarization, we further demonstrate that damage profile can be controlled.
Publication date
PublisherSPIE
LanguageEnglish
Peer reviewedYes
NPARC number21276938
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Record modified2019-08-23
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