Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs
Damage formation on fused silica illuminated with ultraviolet-infrared femtosecond pulse pairs
DOI | Resolve DOI: https://doi.org/10.1117/12.2182633 |
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Author | Search for: Yu, Xiaoming; Search for: Chang, Zenghu; Search for: Corkum, Paul B.1; Search for: Lei, Shuting |
Name affiliation |
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Format | Text, Article |
Proceedings title | Damage to VUV, EUV, and X-ray Optics V |
Series title | Proceedings of SPIE; no. 9511 |
Conference | SPIE Optics + Optoelectronics, April 13-15, 2015, Prague, Czech Republic |
ISSN | 0277-786X 1996-756X |
ISBN | 9781628416329 |
Article number | 95110C |
Subject | electromagnetic pulse; fused silica; ionization; laser pulses; multiphoton processes; photoionization; time delay; ultrafast lasers; ultrashort pulses; X-ray optics; avalanche ionization; damage formation; femtosecond laser machining; multi-photon absorption; multiphoton ionization; pulse durations; rate-equation models; UV pulse; pulse generators |
Abstract | |
Publication date | 2015-05-12 |
Publisher | SPIE |
Language | English |
Peer reviewed | Yes |
NPARC number | 21276938 |
Export citation | Export as RIS |
Report a correction | Report a correction | Record identifier | 3da4efff-3cef-4511-a9d1-b992f7bc0083 |
Record created | 2015-11-10 |
Record modified | 2020-04-22 |