| DOI | Trouver le DOI : https://doi.org/10.1117/12.2182633 |
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| Auteur | Rechercher : Yu, Xiaoming; Rechercher : Chang, Zenghu; Rechercher : Corkum, Paul B.1; Rechercher : Lei, Shuting |
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| Affiliation | - Conseil national de recherches du Canada. Technologies de sécurité et de rupture
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| Format | Texte, Article |
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| Conférence | SPIE Optics + Optoelectronics, April 13-15, 2015, Prague, Czech Republic |
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| Sujet | electromagnetic pulse; fused silica; ionization; laser pulses; multiphoton processes; photoionization; time delay; ultrafast lasers; ultrashort pulses; X-ray optics; avalanche ionization; damage formation; femtosecond laser machining; multi-photon absorption; multiphoton ionization; pulse durations; rate-equation models; UV pulse; pulse generators |
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| Résumé | We investigate damage formation on the surface of fused silica by two femtosecond laser pulses, a tightly focused 266 nm (UV) pulse followed by a loosely focused 800 nm (IR) pulse. We show that the damage size is determined by the UV pulse, and only a small fraction of the normal UV damage threshold energy is needed to cause damage when combined with the properly delayed IR pulse. Our results, analyzed with a rate equation model, suggest that the UV pulse generates seed electrons through multiphoton absorption and the IR pulse utilizes these electrons to cause damage by avalanche ionization. By tuning such parameters like pulse energy, time delay, IR pulse duration and polarization, we further demonstrate that damage profile can be controlled. |
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| Date de publication | 2015-05-12 |
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| Maison d’édition | SPIE |
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| Dans | |
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| Série | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 21276938 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | 3da4efff-3cef-4511-a9d1-b992f7bc0083 |
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| Enregistrement créé | 2015-11-10 |
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| Enregistrement modifié | 2020-04-22 |
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