Suppression of interfacial reaction for HfO2 on Silicon by pre-CF4 plasma treatment

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1063/1.2337002
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Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
  2. National Research Council of Canada. NRC Institute for National Measurement Standards
FormatText, Article
Publication date
In
LanguageEnglish
Peer reviewedYes
NPARC number12744450
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Record identifier406ce93d-78db-4e58-8fa5-b2b9b0387d0d
Record created2009-10-27
Record modified2023-05-10
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