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| DOI | Resolve DOI: https://doi.org/10.1038/s41598-020-69390-4 |
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| Author | Search for: Rahimian, M. G.; Search for: Jain, A.; Search for: Larocque, H.; Search for: Corkum, P. B.; Search for: Karimi, E.; Search for: Bhardwaj, V. R. |
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| Format | Text, Article |
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| Subject | laser material processing; optics and photonics |
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| Abstract | Engineering material properties is key for development of smart materials and next generation nanodevices. This requires nanoscale spatial precision and control to fabricate structures/defects. Lithographic techniques are widely used for nanostructuring in which a geometric pattern on a mask is transferred to a resist by photons or charged particles and subsequently engraved on the substrate. However, direct mask-less fabrication has only been possible with electron and ion beams. That is because light has an inherent disadvantage; the diffraction limit makes it difficult to interact with matter on dimensions smaller than the wavelength of light. Here we demonstrate spatially controlled formation of nanocones on a silicon surface with a positional precision of 50 nm using femtosecond laser ablation comprising a superposition of optical vector vortex and Gaussian beams. Such control and precision opens new opportunities for nano-printing of materials using techniques such as laser-induced forward transfer and in general broadens the scope of laser processing of materials. |
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| Publication date | 2020-07-28 |
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| Publisher | Nature Research |
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| Licence | |
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| Language | English |
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| Peer reviewed | Yes |
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| NRC publication | This is a non-NRC publication"Non-NRC publications" are publications authored by NRC employees prior to their employment by NRC. |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | 571b4bd1-dd9b-45a4-b344-aa5e0a58dc43 |
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| Record created | 2020-12-24 |
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| Record modified | 2020-12-24 |
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