Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol
Atomic Layer Deposition of Hafnium Silicate Thin Films Using Tetrakis(diethylamido)hafnium and Tris(2-methyl-2-butoxy)silanol
DOI | Resolve DOI: https://doi.org/10.1149/1.3137053 |
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Affiliation |
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Format | Text, Article |
Publication date | 2009 |
In | |
Language | English |
Peer reviewed | Yes |
NPARC number | 12441141 |
Export citation | Export as RIS |
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Record identifier | 5eecfa14-2819-431f-8c40-ddd7791d189a |
Record created | 2009-09-25 |
Record modified | 2023-04-19 |
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