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Adhesion Evaluation of Plasma-Deposited Si3N4 and SiO2 Thin Films on Si by the Scratch Method

From National Research Council Canada

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Affiliation
  1. National Research Council of Canada. NRC Institute for Aerospace Research
  2. National Research Council of Canada. NRC Institute for Research in Construction
  3. Ecole Polytechnique
FormatText, Other
PlaceVancouver
Access condition
  • unclassified/unlimited
NRC numberSMPL-1995-0058
NPARC number8929198
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Record identifier637a1218-0a45-466e-8fbb-f1f8632f5ca5
Record created2009-04-23
Record modified2020-03-03
Date modified: