AlGaN/GaN field effect transistors with C-doped GaN buffer layer as an electrical isolation template grown by molecular beam epitaxy

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1016/j.sse.2005.01.012
AuthorSearch for: 1; Search for: 1; Search for: 1; Search for: ; Search for: 2; Search for: 1
Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
  2. National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
FormatText, Article
Publication date
In
NPARC number12744694
Export citationExport as RIS
Report a correctionReport a correction (opens in a new tab)
Record identifier65e231f5-2132-4216-bde0-a1f09997239f
Record created2009-10-27
Record modified2020-04-07
Date modified: