Strain studies of silicon-germanium epilayers on silicon substrates using Raman spectroscopy
Strain studies of silicon-germanium epilayers on silicon substrates using Raman spectroscopy
DOI | Resolve DOI: https://doi.org/10.1063/1.109784 |
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Format | Text, Article |
Publication date | 1993-08-30 |
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Language | English |
NRC number | 1125 |
NPARC number | 8899978 |
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Record identifier | 69b6bfb5-59ad-4c6a-a204-aef243081f17 |
Record created | 2009-04-22 |
Record modified | 2020-04-24 |
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