Low temperature plasma etching for Si3N4 waveguide applications
Low temperature plasma etching for Si3N4 waveguide applications
| DOI | Resolve DOI: https://doi.org/10.1116/1.2836424 |
|---|---|
| Author | Search for: 1; Search for: ; Search for: ; Search for: ; Search for: ; Search for: |
| Affiliation |
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| Format | Text, Article |
| Publication date | 2008 |
| In | |
| NPARC number | 12744647 |
| Export citation | Export as RIS |
| Report a correction | Report a correction (opens in a new tab) |
| Record identifier | 800aa0a3-663d-4393-af30-2aabd23dcfa8 |
| Record created | 2009-10-27 |
| Record modified | 2020-04-15 |
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