Download | - View final version: Polarization insensitive metamaterial engineered multimode interference coupler in a 220 nm silicon-on-insulator platform (PDF, 3.5 MiB)
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DOI | Resolve DOI: https://doi.org/10.1016/j.optlastec.2023.109493 |
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Author | Search for: Pérez-Armenta, Carlos; Search for: Ortega-Moñux, Alejandro; Search for: Manuel Luque-González, José; Search for: Halir, Robert; Search for: Schmid, Jens1; Search for: Cheben, Pavel1; Search for: Molina-Fernández, Iñigo; Search for: Gonzalo Wangüemert-Pérez, J. |
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Affiliation | - National Research Council of Canada. Quantum and Nanotechnologies
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Format | Text, Article |
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Subject | silicon photonics; silicon-on-insulator; subwavelength gratings; multimode interference; polarization insensitivity |
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Abstract | High-index contrast silicon waveguides exhibit strong birefringence that hinders the development of polarization-insensitive devices, especially for sub-micrometer silicon layer thickness. Here a polarization-independent 2 × 2 multimode interference coupler in a 220 nm silicon-on-insulator platform is designed and experimentally demonstrated for the first time. Leveraging the advanced control of electromagnetic properties provided by a subwavelength grating metamaterial topology, our multimode interference coupler operates for both TE and TM polarization states with measured polarization dependent loss, insertion loss and imbalance all less than 1 dB, and phase errors below 5◦ in the wavelength range from 1500 nm to 1560 nm. The device has a footprint of only 3.5 µm × 47.25 µm and was fabricated using a single etch-step process with a minimum feature size of 100 nm compatible with immersion deep-UV lithography. |
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Publication date | 2023-04-25 |
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Publisher | Elsevier |
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Licence | |
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In | |
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Language | English |
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Peer reviewed | Yes |
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Identifier | S0030399223003869 |
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Export citation | Export as RIS |
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Report a correction | Report a correction (opens in a new tab) |
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Record identifier | 80ace21e-8235-439e-aad0-1206317e12f8 |
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Record created | 2024-05-02 |
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Record modified | 2024-05-02 |
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