Process windows of nickel and platinum silicides in deep sub-micron regime
Process windows of nickel and platinum silicides in deep sub-micron regime
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Affiliation |
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Format | Text, Article |
Conference | 1995 MRS Fall Meeting: Silicide Thin Films: Fabrication, Properties, and Applications Symposium, Boston, Massachusetts, November 27-30, 1995 |
Publication date | 1996 |
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Series | |
NPARC number | 12330138 |
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Record identifier | 83b22300-01c0-4c84-ba49-607465a6cce4 |
Record created | 2009-09-10 |
Record modified | 2020-03-20 |
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