Process windows of nickel and platinum silicides in deep sub-micron regime
Process windows of nickel and platinum silicides in deep sub-micron regime
| Author | Search for: 1; Search for: 1; Search for: 1; Search for: ; Search for: 1 |
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| Format | Text, Article |
| Conference | 1995 MRS Fall Meeting: Silicide Thin Films: Fabrication, Properties, and Applications Symposium, Boston, Massachusetts, November 27-30, 1995 |
| Publication date | 1996 |
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| NPARC number | 12330138 |
| Export citation | Export as RIS |
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| Record identifier | 83b22300-01c0-4c84-ba49-607465a6cce4 |
| Record created | 2009-09-10 |
| Record modified | 2020-03-20 |
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