Simulation of the hole and current distributions in Si-Ge p-channel FETs with graded profiles

From National Research Council Canada

Alternative titleSimulation of the hole and current distributions in Si-Ge p-channel FETs with graded Ge profiles
Download
  1. (PDF, 1.1 MiB)
AuthorSearch for: 1; Search for: 1
Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
Conference1995 Second International Semiconductor Device Research Symposium (ISDRS '95), December 5-8, 1995, Charlottesville, Virginia, USA
Publication date
PublisherSchool of Engineering and Applied Science
In
Peer reviewedYes
NPARC number12328252
Export citationExport as RIS
Report a correctionReport a correction (opens in a new tab)
Record identifiera48607af-8b46-4e2e-ac6b-e3935e90f2e4
Record created2009-09-10
Record modified2021-05-31
Date modified: