| Download | - View final version: Photochemical attachment of organic monolayers onto H-terminated Si(111): radical chain propagation observed via STM studies (PDF, 245 KiB)
|
|---|
| DOI | Resolve DOI: https://doi.org/10.1021/ja045777x |
|---|
| Author | Search for: Eves, Brian J.1; Search for: Sun, Qiao-Yu; Search for: Lopinski, Gregory P.1; Search for: Zuilhof, Han |
|---|
| Affiliation | - National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
|
|---|
| Format | Text, Article |
|---|
| Abstract | Photochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required. |
|---|
| Publication date | 2004-11-10 |
|---|
| Publisher | American Chemical Society |
|---|
| In | |
|---|
| Language | English |
|---|
| Peer reviewed | Yes |
|---|
| NPARC number | 12338707 |
|---|
| Export citation | Export as RIS |
|---|
| Report a correction | Report a correction (opens in a new tab) |
|---|
| Record identifier | a57077c2-dad8-4f9f-aafc-bd8960971079 |
|---|
| Record created | 2009-09-10 |
|---|
| Record modified | 2023-04-17 |
|---|
