| Téléchargement | - Voir la version finale : Photochemical attachment of organic monolayers onto H-terminated Si(111): radical chain propagation observed via STM studies (PDF, 245 Kio)
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| DOI | Trouver le DOI : https://doi.org/10.1021/ja045777x |
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| Auteur | Rechercher : Eves, Brian J.1; Rechercher : Sun, Qiao-Yu; Rechercher : Lopinski, Gregory P.1; Rechercher : Zuilhof, Han |
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| Affiliation | - Conseil national de recherches du Canada. Institut Steacie des sciences moléculaires du CNRC
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| Format | Texte, Article |
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| Résumé | Photochemical reactions of terminal alkenes with hydrogen-terminated silicon surfaces are being used by many groups to produce covalently attached organic monolayers with a wide range of terminal functionalities. Despite the considerable activity in this area, the mechanism for these reactions has not been definitively established. Here we present STM and HREELS data on a sequence of partially reacted samples, showing the progress of the reaction. The attachment reaction is found to proceed via formation of irregularly shaped islands that appear to grow by a pseudorandom walk process. These data support a radical chain propagation mechanism previously suggested for this reaction. However, since the photons employed here (447 nm) lack sufficient energy for Si-H bond cleavage, an alternate mechanism for initiating the chain reaction appears to be required. |
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| Date de publication | 2004-11-10 |
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| Maison d’édition | American Chemical Society |
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| Dans | |
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| Langue | anglais |
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| Publications évaluées par des pairs | Oui |
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| Numéro NPARC | 12338707 |
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| Exporter la notice | Exporter en format RIS |
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| Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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| Identificateur de l’enregistrement | a57077c2-dad8-4f9f-aafc-bd8960971079 |
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| Enregistrement créé | 2009-09-10 |
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| Enregistrement modifié | 2023-04-17 |
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