Directions in nanofabrication

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1007/978-3-7091-0424-8_1
AuthorSearch for: 1; Search for: 1
EditorSearch for: Stepanova, Maria; Search for: Dew, Steven
Name affiliation
  1. National Research Council of Canada. National Institute for Nanotechnology
FormatText, Book chapter
Book titleNanofabrication: Techniques and Principles
ISBN978-3-7091-0424-8
978-3-7091-0423-1
Pages3–8
Subjectatomic layer deposition; chemical mechanical polishing; electron beam lithography; nanoimprint lithography; nanofabrication technique
Abstract
Nanotechnology is dependent on nanofabrication techniques to structure matter at the 1–100 nm lengthscale. In this book, a variety of nanofabrication techniques are described, including those for lithography using electron and helium ion beams or nanoimprint lithography; for deposition using atomic layer deposition, surface monolayer formation, block copolymers, or electroepitaxy; and for etching using chemical mechanical polishing, ion beam induced reactions, laser nanopatterning, or anodic oxide templating. In each case, principles, methodology, equipment and process parameters are described, along with capabilities and example applications. Taken together, these represent a powerful toolbox of the rapidly evolving pool of nanofabrication techniques.
Publication date
PublisherSpringer, Vienna
Springer
LanguageEnglish
Peer reviewedYes
NPARC number21275852
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Record modified2020-09-01
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