| DOI | Resolve DOI: https://doi.org/10.1021/nl203488a |
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| Author | Search for: Wu, Nathanael L. Y.1; Search for: Zhang, Xiaojiang1; Search for: Murphy, Jeffrey N.1; Search for: Chai, Jinan1; Search for: Harris, Kenneth D.1; Search for: Buriak, Jillian M.1 |
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| Affiliation | - National Research Council of Canada. National Institute for Nanotechnology
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| Format | Text, Article |
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| Subject | Block copolymer; solvent anneal; self-assembly; density doubling; graphoepitaxy; thin films; nanolines |
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| Abstract | Block copolymers can be used to template large arrays of nanopatterns with periodicities equal to the characteristic spacing of the polymer. Here we demonstrate a technique capitalizing on the multilayered arrangement of cylindrical domains to effectively double the pattern density templated by a given polymer. By controlling the initial thickness of the film and the solvent annealing conditions, it was possible to reproducibly create density doubled lines by swelling the film with solvent until bilayers of horizontal cylinders were obtained. This process was also demonstrated to be compatible with graphoepitaxy. |
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| Publication date | 2011-12-14 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 21268907 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | bc76c3bc-9257-45f5-bf7e-81ebba6942f8 |
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| Record created | 2013-11-25 |
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| Record modified | 2020-04-21 |
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